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		<identifier>8JMKD3MGPAW/3M5JNLP</identifier>
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		<doi>10.1109/SIBGRAPI.2016.067</doi>
		<citationkey>NascimentoCarvAndr:2016:ImSeBa</citationkey>
		<title>Improving the Selection of Bases of BRDFs for Appearance Preservation</title>
		<format>On-line</format>
		<year>2016</year>
		<numberoffiles>1</numberoffiles>
		<size>7000 KiB</size>
		<author>Nascimento, Fernando Melo,</author>
		<author>Carvalho, André Britto de,</author>
		<author>Andrade, Beatriz Trinchão,</author>
		<affiliation>Universidade Federal de Sergipe</affiliation>
		<affiliation>Universidade Federal de Sergipe</affiliation>
		<affiliation>Universidade Federal de Sergipe</affiliation>
		<editor>Aliaga, Daniel G.,</editor>
		<editor>Davis, Larry S.,</editor>
		<editor>Farias, Ricardo C.,</editor>
		<editor>Fernandes, Leandro A. F.,</editor>
		<editor>Gibson, Stuart J.,</editor>
		<editor>Giraldi, Gilson A.,</editor>
		<editor>Gois, João Paulo,</editor>
		<editor>Maciel, Anderson,</editor>
		<editor>Menotti, David,</editor>
		<editor>Miranda, Paulo A. V.,</editor>
		<editor>Musse, Soraia,</editor>
		<editor>Namikawa, Laercio,</editor>
		<editor>Pamplona, Mauricio,</editor>
		<editor>Papa, João Paulo,</editor>
		<editor>Santos, Jefersson dos,</editor>
		<editor>Schwartz, William Robson,</editor>
		<editor>Thomaz, Carlos E.,</editor>
		<e-mailaddress>nascimentofm@ufs.br</e-mailaddress>
		<conferencename>Conference on Graphics, Patterns and Images, 29 (SIBGRAPI)</conferencename>
		<conferencelocation>São José dos Campos, SP, Brazil</conferencelocation>
		<date>4-7 Oct. 2016</date>
		<publisher>IEEE Computer Society´s Conference Publishing Services</publisher>
		<publisheraddress>Los Alamitos</publisheraddress>
		<booktitle>Proceedings</booktitle>
		<tertiarytype>Full Paper</tertiarytype>
		<transferableflag>1</transferableflag>
		<versiontype>finaldraft</versiontype>
		<keywords>clustering, appearance modeling, genetic algorithms, linear combination of BRDFs.</keywords>
		<abstract>An important step in the appearance preservation of real materials is the analysis of how they interact with light. Since this phenomena happens at a microscopic level, heuristics with different complexity have been developed to capture and reproduce it. In order to minimize sampling efforts, one of these approaches consists in representing the reflectance of a material as a linear combination of a basis of known reflectance functions. To accomplish realistic and efficient representations, this basis must be expressive and contain a reduced number of elements. This work presents three approaches to select such basis. The first one performs an empirical leave-one-out optimization procedure. The other two are based on classical and evolutionary clustering algorithms. To improve clustering results, a new BRDF-oriented fitness function is designed. These approaches are evaluated using NNLS algorithm to estimate sampled materials and a comparison based on numerical precision is performed.</abstract>
		<language>en</language>
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		<usergroup>nascimentofm@ufs.br</usergroup>
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